ARTICLES

Investigation of electropolishing characteristics of tungsten in ecofriendly sodium hydroxide aqueous solution

  • Wei Han ,
  • Feng-Zhou Fang
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  • 1 Centre of Micro/Nano manufacturing Technology(MNMTDublin), University College Dublin, Dublin 4, Ireland;
    2 State Key Laboratory of Precision Measuring Technology and Instruments, Centre of Micro/Nano Manufacturing Technology(MNMT), Tianjin University, Tianjin 300072, People's Republic of China

Received date: 2020-02-02

  Revised date: 2020-03-17

  Online published: 2020-09-10

Supported by

The authors would like to thank the support received from the Science Foundation Ireland (SFI) (Grant No. 15/RP/B3208) and the National Natural Science Foundation of China (NSFC) (Grant No. 61635008). This project has also received funding from the Enterprise Ireland and the European Union’s Horizon 2020 Research and Innovation Programme under the Marie Skłodowska– Curie Grant agreement (Grant No 713654).

Abstract

In this study, an eco-friendly electrolyte for electropolishing tungsten and the minimum material removal depth on the electropolished tungsten surface are investigated using an electrochemical etching method. Using a concentrated acid electrolyte, the polarization curve and current density transient are observed. For a NaOH electrolyte, the effects of interelectrode gap and electrolyte concentration on electropolishing are investigated. The differences in electropolishing characteristics are compared among different electrolyte types. Microholes are etched on the electropolished tungsten surface to determine the minimum material removal depth on the tungsten surface. Experimental results indicate the color effect due to a change in the thickness of the oxide film on the tungsten surface after electropolishing with a concentrated acid electrolyte. The surface roughness decreases with the interelectrode gap width owing to the increased current density when using the NaOH electrolyte. However, the electropolishing effect is less prominent with a significantly smaller gap because the generated bubbles are unable to escape from the narrow working gap in time. A material removal depth of less than 10 nm is achieved on the tungsten surface in an area of diameter 300 lm, using the electrochemical etching method.

The full text can be downloaded at https://link.springer.com/article/10.1007/s40436-020-00309-y

Cite this article

Wei Han , Feng-Zhou Fang . Investigation of electropolishing characteristics of tungsten in ecofriendly sodium hydroxide aqueous solution[J]. Advances in Manufacturing, 2020 , 8(3) : 265 -278 . DOI: 10.1007/s40436-020-00309-y

References

1. Fan HG, Tsai HL, Na SJ (2001) Heat transfer and fluid flow in a partially or fully penetrated weld pool in gas tungsten arc welding. Int J Heat Mass Transf 44:417-428
2. Tanaka M, Shimizu T, Terasaki H et al (2000) Effects of activating flux on arc phenomena in gas tungsten arc welding. Sci Technol Weld Join 5:397-402
3. Abyzov AM, Kidalov SV, Shakhov FM (2011) High thermal conductivity composites consisting of diamond filler with tungsten coating and copper (silver) matrix. J Mater Sci 46:1424-1438
4. Ju BF, Chen YL, Fu M et al (2009) Systematic study of electropolishing technique for improving the quality and production reproducibility of tungsten STM probe. Sens Actuators A Phys 155:136-144
5. Kelsey GS (1977) The anodic oxidation of tungsten in aqueous base. J Electrochem Soc 124:814-819
6. Han W, Kunieda M (2019) A novel method to switch machining mode between micro-ECM and micro-EDM using oxide film on surface of tungsten electrode. Precis Eng 56:455-465
7. Wang J, Fang FZ, Yan G et al (2019) Study on diamond cutting of ion implanted tungsten carbide with and without ultrasonic vibration. Nanomanuf Metrol 2:177-185
8. Wang XL, Han LH, Geng YQ et al (2019) The simulation and research of etching function based on scanning electrochemical microscopy. Nanomanuf Metrol 2:160-167
9. Fang FZ, Zhang N, Guo D et al (2019) Towards atomic and close-to-atomic scale manufacturing. Int J Extrem Manuf 1:1-33
10. Fang FZ, Xu F (2018) Recent advances in micro/nano-cutting:effect of tool edge and material properties. Nanomanuf Metrol 1:4-31
11. Suzuki N, Haritani M, Yang J et al (2007) Elliptical vibration cutting of tungsten alloy molds for optical glass parts. CIRP Ann Manuf Technol 56:127-130
12. Sarkar S, Sekh M, Mitra S et al (2008) Modeling and optimization of wire electrical discharge machining of c-TiAl in trim cutting operation. J Mater Process Technol 17:525-536
13. Chen HC, Lin JC, Yang YK et al (2010) Optimization of wire electrical discharge machining for pure tungsten using a neural network integrated simulated annealing approach. Expert Syst Appl 37:7147-7153
14. Yang RT, Tzeng CJ, Yang YK et al (2012) Optimization of wire electrical discharge machining process parameters for cutting tungsten. Int J Adv Manuf Technol 60:135-147
15. Masuzawa T (2000) State of the art of micromachining. CIRP Ann Manuf Technol 49:473-488
16. Reinhardt KA, Kern W (2018) Handbook of silicon wafer cleaning technology, 3rd edn. William Andrew, Park Ridge
17. Fang FZ, Zhang XD, Gao W et al (2017) Nanomanufacturing-perspective and applications. CIRP Ann Manuf Technol 66:683-705
18. Bielmann M, Mahajan U, Singh RK (1999) Effect of particle size during tungsten chemical mechanical polishing. Mater Res Soc Symp Proc 2:401-403
19. Larsen-Basse J, Liang H (1999) Probable role of abrasion in chemo-mechanical polishing of tungsten. Wear 233(235):647-654
20. Nanz G, Camilletti LE (1995) Modeling of chemical-mechanical polishing:a review. IEEE Trans Semicond Manuf 8(4):382-389
21. Wang F, Zhang X, Deng H (2019) A comprehensive study on electrochemical polishing of tungsten. Appl Surf Sci 475:587-597
22. Han W, Fang FZ (2020) Investigation of electrochemical properties of electropolishing Co-Cr dental alloy. J Appl Electrochem 50:367-381
23. Han W, Fang FZ (2020) Two-step electropolishing of 316L stainless steel in a sulfuric acid-free electrolyte. J Mater Process Technol 279:116558
24. Han W, Fang FZ (2019) Fundamental aspects and recent developments in electropolishing. Int J Mach Tools Manuf 139:1-23
25. Schubert N, Schneider M, Michaelis A et al (2018) Electrochemical machining of tungsten carbide. J Solid State Electrochem 22:859-868
26. Han W, Fang FZ (2019) Electropolishing of 316L stainless steel using sulfuric acid-free electrolyte. J Manuf Sci Eng 141:101015
27. Hu YN, Zhou H, Liao LP et al (2003) Surface quality analysis of the electropolishing of cemented carbide. J Mater Process Technol 139:253-256
28. Holstein N, Krauss W, Konys J et al (2016) Advanced electrochemical machining (ECM) for tungsten surface micro-structuring in blanket applications. Fusion Eng Des 109:956-960
29. Lee ES, Shin TH (2011) An evaluation of the machinability of nitinol shape memory alloy by electrochemical polishing. J Mech Sci Technol 25:963-969
30. Rajurkar KP, Zhu D, McGeough JA et al (1999) New developments in electro-chemical machining. CIRP Ann Manuf Technol 48:567-579
31. Piotrowski O, Madore C, Landoly D (1998) The mechanism of electropolishing of titanium in methanol-sulfuric acid electrolytes. J Electrochem Soc 145:2362-2369
32. Anik M (2006) Effect of concentration gradient on the anodic behavior of tungsten. Corros Sci 48:4158-4173
33. Anik M, Osseo-Asare K (2002) Effect of pH on the anodic behavior of tungsten. J Electrochem Soc 149:B224-B233
34. Di PA, Di QF, Sunseri C (1980) Anodic oxide films on tungstenI. The influence of anodizing parameters on charging curves and film composition. Corros Sci 20:1067-1078
35. Evans TE, Hart AC, Skedgell AN (1973) The nature of the film on coloured stainless steel. Trans IMF 51:108-112
36. Shimasaki T, Kunieda M (2016) Study on influences of bubbles on ECM gap phenomena using transparent electrode. CIRP Ann Manuf Technol 65:225-228
37. Zhang R, Ivey DG (1996) Preparation of sharp polycrystalline tungsten tips for scanning tunneling microscopy imaging. J Vac Sci Technol B Microelectron Nanom Struct 14:1-10
38. Krauss W, Holstein N, Konys J (2007) Strategies in electrochemical machining of tungsten for divertor application. Fusion Eng Des 82:1799-1805
39. Park JJ, Il PS, Lee SB (2004) Growth kinetics of passivating oxide film of Inconel alloy 600 in 0.1 M Na2SO4 solution at 25-300 ℃ using the abrading electrode technique and ac impedance spectroscopy. Electrochim Acta 49:281-292
40. Schuster R, Kirchner V, Allongue P et al (2000) Electrochemical micromachining. Science 289:98-111
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