Integrated color defect detection method for polysilicon wafers
using machine vision

doi:10.1007/s40436-014-0095-9

Advances in Manufacturing ›› 2014, Vol. 2 ›› Issue (4): 318-326.doi: 10.1007/s40436-014-0095-9

Integrated color defect detection method for polysilicon wafers using machine vision

Zai-Fang Zhang,Yuan Liu,Xiao-Song Wu,Shu-Lin Kan

School of Mechatronic and Automation Engineering, Shanghai University

收稿日期:2014-05-17 出版日期:2014-12-25 发布日期:2014-12-25
通讯作者: e-mail: zaifangzhang@shu.edu.cn
作者简介:e-mail: zaifangzhang@shu.edu.cn

Integrated color defect detection method for polysilicon wafers using machine vision

Zai-Fang Zhang,Yuan Liu,Xiao-Song Wu,Shu-Lin Kan

School of Mechatronic and Automation Engineering, Shanghai University

Received:2014-05-17 Online:2014-12-25 Published:2014-12-25
Contact: e-mail: zaifangzhang@shu.edu.cn
About author:e-mail: zaifangzhang@shu.edu.cn

摘要/Abstract

摘要： For the typical color defects of polysilicon wafers, i.e., edge discoloration, color inaccuracy and color non-uniformity, a new integrated machine vision detection method is proposed based on an HSV color model. By transforming RGB image into three-channel HSV images, the HSV model can efficiently reduce the disturbances of complex wafer textures. A fuzzy color clustering method is used to detect edge discoloration by defining membership function for each channel image. The mean-value classifying method and region growing method are used to identify the other two defects, respectively. A vision detection system is developed and applied in the production of polysilicon wafers.

关键词: Polysilicon wafers , Color defect detection , Machine vision , Fuzzy color clustering , Region growing method

Abstract: For the typical color defects of polysilicon wafers, i.e., edge discoloration, color inaccuracy and color non-uniformity, a new integrated machine vision detection method is proposed based on an HSV color model. By transforming RGB image into three-channel HSV images, the HSV model can efficiently reduce the disturbances of complex wafer textures. A fuzzy color clustering method is used to detect edge discoloration by defining membership function for each channel image. The mean-value classifying method and region growing method are used to identify the other two defects, respectively. A vision detection system is developed and applied in the production of polysilicon wafers.

Key words: Polysilicon wafers , Color defect detection , Machine vision , Fuzzy color clustering , Region growing method

Zai-Fang Zhang,Yuan Liu,Xiao-Song Wu,Shu-Lin Kan. Integrated color defect detection method for polysilicon wafers using machine vision[J]. Advances in Manufacturing, 2014, 2(4): 318-326.

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Integrated color defect detection method for polysilicon wafers using machine vision

Integrated color defect detection method for polysilicon wafers using machine vision

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