Advances in Manufacturing ›› 2020, Vol. 8 ›› Issue (1): 97-106.doi: 10.1007/s40436-020-00291-5

• ARTICLES • 上一篇    下一篇

Sensitivity analysis of the surface integrity of monocrystalline silicon to grinding speed with same grain depth-of-cut

Ping Zhou, Zi-Guang Wang, Ying Yan, Ning Huang, Ren-Ke Kang, Dong-Ming Guo   

  1. Key Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian 116024, Liaoning, People's Republic of China
  • 收稿日期:2019-06-05 修回日期:2019-09-16 出版日期:2020-03-25 发布日期:2020-03-07
  • 通讯作者: Ping Zhou E-mail:pzhou@dlut.edu.cn
  • 基金资助:
    The authors appreciate the financial support from the National Natural Science Foundation of China (Grant Nos. 51875078, 51991372), National Key Research and Development Program of China (Grant No. 2016YFB1102205) and the Science Fund for Creative Research Groups of the National Natural Science Foundation of China (Grant No. 51621064).

Sensitivity analysis of the surface integrity of monocrystalline silicon to grinding speed with same grain depth-of-cut

Ping Zhou, Zi-Guang Wang, Ying Yan, Ning Huang, Ren-Ke Kang, Dong-Ming Guo   

  1. Key Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian 116024, Liaoning, People's Republic of China
  • Received:2019-06-05 Revised:2019-09-16 Online:2020-03-25 Published:2020-03-07
  • Contact: Ping Zhou E-mail:pzhou@dlut.edu.cn
  • Supported by:
    The authors appreciate the financial support from the National Natural Science Foundation of China (Grant Nos. 51875078, 51991372), National Key Research and Development Program of China (Grant No. 2016YFB1102205) and the Science Fund for Creative Research Groups of the National Natural Science Foundation of China (Grant No. 51621064).

摘要: Mechanisms for removal of materials during the grinding process of monocrystalline silicon have been extensively studied in the past several decades. However, debates over whether the cutting speed significantly affects the surface integrity are ongoing. To address this debate, this study comprehensively investigates the effects of cutting speed on surface roughness, subsurface damage, residual stress, and grinding force for a constant grain depth-of-cut. The results illustrate that the changes in the surface roughness and subsurface damage relative to the grinding speed are less obvious when the material is removed in ductile-mode as opposed to in the brittle-ductile mixed mode. A notable finding is that there is no positive correlation between grinding force and surface integrity. The results of this study could be useful for further investigations on fundamental and technical analysis of the precision grinding of brittle materials.

The full text can be downloaded at https://link.springer.com/content/pdf/10.1007%2Fs40436-020-00291-5.pdf

关键词: Rotational grinding, Silicon wafer, Surface integrity, Cutting speed, Residual stress

Abstract: Mechanisms for removal of materials during the grinding process of monocrystalline silicon have been extensively studied in the past several decades. However, debates over whether the cutting speed significantly affects the surface integrity are ongoing. To address this debate, this study comprehensively investigates the effects of cutting speed on surface roughness, subsurface damage, residual stress, and grinding force for a constant grain depth-of-cut. The results illustrate that the changes in the surface roughness and subsurface damage relative to the grinding speed are less obvious when the material is removed in ductile-mode as opposed to in the brittle-ductile mixed mode. A notable finding is that there is no positive correlation between grinding force and surface integrity. The results of this study could be useful for further investigations on fundamental and technical analysis of the precision grinding of brittle materials.

The full text can be downloaded at https://link.springer.com/content/pdf/10.1007%2Fs40436-020-00291-5.pdf

Key words: Rotational grinding, Silicon wafer, Surface integrity, Cutting speed, Residual stress