Advances in Manufacturing ›› 2020, Vol. 8 ›› Issue (3): 361-368.doi: 10.1007/s40436-020-00316-z

• ARTICLES • Previous Articles    

Study into grinding force in back grinding of wafer with outer rim

Xiang-Long Zhu, Yu Li, Zhi-Gang Dong, Ren-Ke Kang, Shang Gao   

  1. Key Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian 116024, People's Republic of China
  • Received:2019-12-03 Revised:2020-01-29 Published:2020-09-10
  • Contact: Ren-Ke Kang E-mail:kangrk@dlut.edu.cn
  • Supported by:
    The authors gratefully acknowledge the financial support from the National Key Research and Development Program of China (Grant No. 2016YFB1102205) and the National Natural Science Foundation of China (Grant No. 51775084).

Abstract: Back grinding of wafer with outer rim (BGWOR) is a new method for carrier-less thinning of silicon wafers. At present, the effects of process parameters on the grinding force remain debatable. Therefore, a BGWOR normal grinding force model based on grain depth-of-cut was established, and the relationship between grinding parameters (wheel infeed rate, wheel rotational speed, and chuck rotational speed) and normal grinding force was discussed. Further, a series of experiments were performed to verify the BGWOR normal grinding force model. This study proves that the BGWOR normal grinding force is related to the rotational direction of the wheel and chuck, and the effect of grinding mark density on the BGWOR normal grinding force cannot be ignored. Moreover, this study provides methods for reducing the grinding force and optimizing the back thinning process of the silicon wafer.

The full text can be downloaded at https://link.springer.com/article/10.1007/s40436-020-00316-z

Key words: Silicon wafer, Back grinding of wafer with outer rim (BGWOR), Grinding force, Grinding mark density