Abstract: In this study, an eco-friendly electrolyte for electropolishing tungsten and the minimum material removal depth on the electropolished tungsten surface are investigated using an electrochemical etching method. Using a concentrated acid electrolyte, the polarization curve and current density transient are observed. For a NaOH electrolyte, the effects of interelectrode gap and electrolyte concentration on electropolishing are investigated. The differences in electropolishing characteristics are compared among different electrolyte types. Microholes are etched on the electropolished tungsten surface to determine the minimum material removal depth on the tungsten surface. Experimental results indicate the color effect due to a change in the thickness of the oxide film on the tungsten surface after electropolishing with a concentrated acid electrolyte. The surface roughness decreases with the interelectrode gap width owing to the increased current density when using the NaOH electrolyte. However, the electropolishing effect is less prominent with a significantly smaller gap because the generated bubbles are unable to escape from the narrow working gap in time. A material removal depth of less than 10 nm is achieved on the tungsten surface in an area of diameter 300 lm, using the electrochemical etching method.

The full text can be downloaded at https://link.springer.com/article/10.1007/s40436-020-00309-y

Key words: Electropolishing, NaOH solution, Surface roughness, Tungsten, Etching