Advances in Manufacturing ›› 2023, Vol. 11 ›› Issue (2): 203-211.doi: 10.1007/s40436-022-00419-9

• ARTICLES • 上一篇    

Preparation and atmospheric wet-reflow of indium microbump for low-temperature flip-chip applications

Wen-Hui Zhu1,2, Xiao-Yu Xiao1,2, Zhuo Chen1,2, Gui Chen1,2, Ya-Mei Yan1,2, Lian-Cheng Wang1,2, Gang-Long Li3   

  1. 1. State Key Laboratory of High Performance Complex Manufacturing, Central South University, Changsha, 410083, People's Republic of China;
    2. College of Mechanical and Electrical Engineering, Central South University, Changsha, 410083, People's Republic of China;
    3. School of Mechanical and Electrical Engineering, East China University of Technology, Nanchang, 330013, People's Republic of China
  • 收稿日期:2022-05-22 修回日期:2022-08-10 发布日期:2023-05-20
  • 通讯作者: Zhuo Chen,E-mail:zhuochen@csu.edu.cn E-mail:zhuochen@csu.edu.cn
  • 作者简介:Wen?Hui Zhu (Senior Member, IEEE) received the Ph.D. degree in applied physics from the National University of Defense Technology, Changsha, China, in 1995. He is currently a Professor with Central South University, Changsha. He is also the Chief Scientist in leading the 973 Program on 3-D integration for 20-/14-nm IC. His current research interests include advanced packaging, modeling, simulation, and microelectronics manufacturing.
    Xiao?Yu Xiao is currently pursuing the master's degree with the College of Mechanical and Electrical Engineering, Central South University, Changsha, China.
    Zhuo Chen received Ph.D. degree in materials science from Shanghai Jiao Tong University, Shanghai, China, in 2015. He is currently an Associate Professor with Central South University, Changsha, China. His research interests include advanced packaging and microelectronics manufacturing.
    Gui Chen is currently pursuing the master's degree with the School of Mechanical and Electrical Engineering, Central South University, Changsha, China.
    Ya?Mei Yan is currently pursuing the master's degree with the School of Mechanical and Electrical Engineering, Central South University, Changsha, China.
    Lian?Cheng Wang (Member, IEEE) received the Ph.D. degree from the Chinese Academy of Sciences, Beijing, China, in 2013. He has been a Professor with Central South University (CSU), Changsha, China, since 2017. With over 60 articles published, he is currently leading research in wide bandgap semiconductor materials and devices in CSU.
    Gang?Long Li is with East China University of Technology as a lecturer in Nanchang, China. He received Ph.D. degree from Central South University, Changsha, China, in 2019. His main research feld is the reliability of device packaging.
  • 基金资助:
    This research was funded by the National Natural Science Foundation of China (Grant No. U20A6004), the Natural Science Foundation of Hunan Province (Grant No. 2021JJ40734), the State Key Laboratory of High Performance Complex Manufacturing (Grant No. ZZYJKT2020-08) and the Key Project of Science and Technology of Changsha (Grant No.kq2102005).

Preparation and atmospheric wet-reflow of indium microbump for low-temperature flip-chip applications

Wen-Hui Zhu1,2, Xiao-Yu Xiao1,2, Zhuo Chen1,2, Gui Chen1,2, Ya-Mei Yan1,2, Lian-Cheng Wang1,2, Gang-Long Li3   

  1. 1. State Key Laboratory of High Performance Complex Manufacturing, Central South University, Changsha, 410083, People's Republic of China;
    2. College of Mechanical and Electrical Engineering, Central South University, Changsha, 410083, People's Republic of China;
    3. School of Mechanical and Electrical Engineering, East China University of Technology, Nanchang, 330013, People's Republic of China
  • Received:2022-05-22 Revised:2022-08-10 Published:2023-05-20
  • Contact: Zhuo Chen,E-mail:zhuochen@csu.edu.cn E-mail:zhuochen@csu.edu.cn
  • Supported by:
    This research was funded by the National Natural Science Foundation of China (Grant No. U20A6004), the Natural Science Foundation of Hunan Province (Grant No. 2021JJ40734), the State Key Laboratory of High Performance Complex Manufacturing (Grant No. ZZYJKT2020-08) and the Key Project of Science and Technology of Changsha (Grant No.kq2102005).

摘要: An urgent demand for lowering bonding temperature has been put forward by advanced flip-chip integration such as micro-LED packaging and heterogeneous integration of semiconductor devices. Indium microbump with low-melting point has attracted attention for its potential use as the interconnection intermediate, and the development of its fabrication process is therefore of great attraction. To reveal the critical process factors for successfully fabricating a high-density In microbump array, this paper investigated a simple process flow of In patterning and reflow and detailed the flux-assisted wet reflow process. Critical process conditions, including the patterned In volume, alignment accuracy, reflow reagent liquidity, and temperature profile, were described, with a particular emphasis on the role of surface tension of molten indium film during the formation of spherical microbumps. A high-density indium ball array with an overall yield greater than 99.7% can be obtained, which suggests that the In patterning and wet-reflow processes are robust and that a high-quality microbump array could be readily formed with low equipment requirements. Furthermore, the interfacial reaction characteristics between In microbump and Au adhesion layer were investigated under thermal aging conditions, which revealed lateral intermetallic growth of AuIn2 compound and well-retained interfacial strength even after prolonged aging.

The full text can be downloaded at https://link.springer.com/article/10.1007/s40436-022-00419-9

关键词: Flip chip, Reflow, Indium microbump, Au-In intermetallics

Abstract: An urgent demand for lowering bonding temperature has been put forward by advanced flip-chip integration such as micro-LED packaging and heterogeneous integration of semiconductor devices. Indium microbump with low-melting point has attracted attention for its potential use as the interconnection intermediate, and the development of its fabrication process is therefore of great attraction. To reveal the critical process factors for successfully fabricating a high-density In microbump array, this paper investigated a simple process flow of In patterning and reflow and detailed the flux-assisted wet reflow process. Critical process conditions, including the patterned In volume, alignment accuracy, reflow reagent liquidity, and temperature profile, were described, with a particular emphasis on the role of surface tension of molten indium film during the formation of spherical microbumps. A high-density indium ball array with an overall yield greater than 99.7% can be obtained, which suggests that the In patterning and wet-reflow processes are robust and that a high-quality microbump array could be readily formed with low equipment requirements. Furthermore, the interfacial reaction characteristics between In microbump and Au adhesion layer were investigated under thermal aging conditions, which revealed lateral intermetallic growth of AuIn2 compound and well-retained interfacial strength even after prolonged aging.

The full text can be downloaded at https://link.springer.com/article/10.1007/s40436-022-00419-9

Key words: Flip chip, Reflow, Indium microbump, Au-In intermetallics